Samsung installed first high-NA EUV machinery for 1.4nm production in March and will look to reduce tariffs to better compete with TSMC

Samsung Installs First High-NA EUV for 1.4nm in March, Zero-Tariff Edge Could Pressure TSMC

Samsung is pressing ahead in the race to sub-2nm chips, and the path runs through ASML’s high-NA EUV lithography. These next-generation machines are staggeringly expensive—around $400 million each—yet they’re essential for building cutting-edge 2nm and 1.4nm nodes at competitive yields and volumes. To keep momentum high and costs in check, South Korea is reportedly preparing to drop import tariffs on advanced semiconductor equipment and materials, a move aimed at strengthening the country’s chipmaking ecosystem and helping Samsung close the gap with its fiercest rival, TSMC.

The company has already started laying the groundwork. An ASML EXE:5000 high-NA EUV tool was installed at Samsung’s Hwaseong campus in March, a key step toward its 1.4nm roadmap. While earlier rumors suggested Samsung might abandon 1.4nm, the new plan points to mass production in 2027, potentially positioning the firm to seize an early lead at that node.

Nearer term, Samsung’s focus is on accelerating 2nm gate-all-around (GAA) chip production. After navigating yield challenges, the 2nm process is reportedly on track, with the Exynos 2600 said to be prepared for mass production later this year. If Samsung demonstrates that its 2nm GAA node can match TSMC’s performance while sustaining high-volume output, it would open the door to larger external orders—an important milestone for foundry market share.

According to Economic News Daily, South Korea’s plan to reduce tariffs to zero is designed to boost competitiveness and reduce the burden of capital expenditures tied to high-NA EUV adoption. Considering the price of each tool and the scale required to ramp 2nm wafer production, tariff relief could meaningfully lower total project costs and speed up fab readiness.

Samsung has also been reported to be placing additional orders for high-NA EUV systems, reinforcing its commitment to an aggressive advanced-node roadmap. Combining government-backed cost relief with early deployment of high-NA tools puts the company in a stronger position to refine yields, scale capacity, and court major customers as 2nm moves into mass production.

With a 2nm GAA push now in motion and a 1.4nm target set for 2027, Samsung is signaling that it intends to compete at the very front of semiconductor manufacturing. If tariff cuts materialize and high-NA EUV rollouts continue on schedule, the company could gain the operational footing it needs to challenge the market leader at both performance and volume.